In the realm of science and technology, harnessing coherent light sources in the deep ultraviolet (DUV) region holds immense significance across various applications such as lithography, defect inspection, metrology, and spectroscopy. Traditionally, high-power 193-nanometer (nm) lasers have been pivotal in lithography, forming an integral part of systems used for precise patterning. However, the coherence limitations associated with conventional ArF excimer lasers hinder their effectiveness in applications requiring high-resolution patterns, like interference lithography.
